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Prof. Johnson Kwame Efavi (Bsc(Mat Eng)(KNUST) MSc(Mat. Sci. & Eng) CAU, PhD(Elect Mat Sci & Eng) RWTH A. ACHEN Germany)

Prof. Johnson Kwame Efavi (Bsc(Mat Eng)(KNUST) MSc(Mat. Sci. & Eng) CAU, PhD(Elect Mat Sci & Eng) RWTH A. ACHEN Germany)
Professor
jkefavi@ug.edu.gh
+233-244-111-217

About Lecturer

Prof. Johnson Kwame Efavi is a currently an Associate Professor and holds a PhD and MSE in materials science and engineering from RWTH Aachen University, Aachen, Germany, 2003 – 2007, Ph.D. Materials Science and Engineering (Electronic Materials- Metal/High-k Gate Stacks for CMOS Applications) and Christian Albrechts University, Kiel, Germany, 2000 – 2002, M.Sc. in Materials Science and Engineering. He also holds a PGD in management specializing in human resource management.

Over the years Prof. Efavi has had an extensive research and work experience from Germany, Belgium and Canada. Some of the major research works accomplished include:

  1. Development of Cassava Bioplastics for Consumer Packaging
  2. Processing of Waste Polyethylene into Polymer-Ceramic Composite through Lipid Assisted Melt Compounding.
  3. Development of Natural Fiber-Reinforced Plastic Waste Composites For Constructional Purposes.
  4. Investigation into the Production of Coconut Husk fiberboards        
  5. Development of Porous Ceramic Bodies for High Temperature Industrial Applications
  6. EU – Si Based Nanomaterials and Nanodevices Project: Metal Gate Screening for submicron Transistor
  7. KrisMOS (Cristalline Gate-Stacks for sub 100nm CMOS Transistors on FD-SOI) PULL-NANO (PULLing the Limits of NANOcmos Electronics)
  8. MegaEPOS („Metal-Gate-Electrodes and Epitaxial Oxides  as  Gate-Stacks for Future CMOS-Logic- and Memory Generations“)
  9. Metal Gate Development for NanoCMOS Technologies
  10. PVD Metal Gate Submicron Transistor Technologies

 

Research Interests

Currently my research focus is on the development of new materials and processes for the materials industry to address environmental, economic, and social issues. The goal is to develop environmentally, economically, and socially viable routes for materials that will lead to a sustainable materials industry with an ultimate aim of minimizing pollution, waste, and energy consumption with emphasis on nanomaterials.

This theme provides research solutions that promote and enhance the development of a materials industry necessary for economic sustainability of Ghana.

Research Works and Publications

  1. A. Yaya, D. Dodoo-Arhin, E. Tiburu, B. Onwona-Agyeman, J.K. Efavi, (2014), A Comparative Study of DFT/LDA with Higher Levels of Theory on π-π Interactions: A typical case for the Benzene Dimer, Journal of Computational Modelling, Vol. 4(3), pp.27-42.
  1. J.K. Efavi, Abu Yaya, Julius Fobil, (2014), Development and Comparative Analysis of Aluminosilicate Based Ceramic Filters for Ground Water Defluoridation, Journal of Advanced Materials Research, Vol. 936, pp822-828.
  1. B. Agyei-Tuffour, Y.D. Bensah, D. Dodoo-Arhin, Abu Yaya, L.N.W. Damoah, E. Nyankson, E. Annan, J.K. Efavi,  (2013), Synthesis and Microstructural Characterization of Kaolin-Polyethylene composites, Journal of Polymer Composites, Vol 7, No. 6, June.
  1. J.K. Efavi, J.K.M. Kuwornu, (2013), Harnessing Natural Resource Wealth for Development: The Case of Ghana, Public Policy and Administration Research, Vol. 3, No. 3, pp1-7.
  1. W. Affo, N.Y. Samuel, R. Amponsah, J.K. Efavi, (2012), Development of Cassava Bioplastics for Consumer Packaging, Journal of the Ghana Science Association, Vol. 14, No. 2, December, pp1-10.
  1. Y.D. Bensah, B. Agyei-Tuffour, L.N.W. Damoah, J.K. Efavi, (2012), Processing of waste Polyethylene into Polymer-Ceramic Composite through Lipid Assisted Melt Compounding, ARPN Journal of Engineering and Applied Sciences, Vol 7, No. 6, June.
  1. J.K. Efavi, L. Damoah, D.Y. Bensah, D. Dodoo-Arhin, D. Tetteh, (2012), Development of Porous Ceramic Bodies from Kaolin Deposits for Industrial Applications, Journal of Applied Clay Science, April, pp31-36.
  1. P.A. Sakyi, J.K. Efavi, d. atta-Peters, R. Asare, (2012), Ghana’s Quest for Oil and Gas:  Ecological Risks and Management Frameworks, West African Journal of Applied Ecology, Vol. 20 (1), pp57-70.
  1. F.K. Rodrigues, G. Armah, J. Fobil, M. Steiner-Asiedu, J.K. Efavi, B. Addy, (2012), UV Irradiation of Shigella Dysenteriae Induced the Transformation and Excision of a Presumed Integrated Lysogenic Prophage shd-4L10 into a Lytic Phase, Journal of Ghana Science Association, Vol. 14 No. June, pp54-62.
  1. A. Yaya, D. Dodoo-Arhin, J.K. Efavi, D.S. Konadu, (2012), The Effect of Decahydronaphthalin on the Mechanical Polypropylene Nanocomposites, ARPN Journal of Engineering and Applied Sciences, Vol. 7, No. 10, October, pp1342-1348.
  1. J. Efavi, S. Abermann, M. Lemme and E. Bertagnolli, (2007), Processing and Evaluation of Metal Gate/High-k/Si Capacitors Incorporating Al, Ni, TiN and Mo as Metal Gates and ZrO2 and HfO2 as High-k Dielectric, Microelectronic Engineering, 84, 1635-1638.
  1. T. Echtermeyer, H.D.B. Gottlob, T. Wahlbrink, T. Mollenhauer, M. Schmidt, J.K. Efavi, M.C. Lemme, H. Kurz, (2007), Investigation of MOS Capacitors and SOI MOSFETs with Epitaxial Gadolinium Oxide (Gd2O3) and Titanium Nitride Electrodes, Solid State Electronics, Vol. 51 (2007), pp 617-621.
  1. S. Abermann, J. Efavi, G. Sjoblom, M. Lemme, J. Olsoon, E. Bertagnolli, (2007), Impact of Al-, Ni-, TiN-, and Mo-metal gates on MOCVD-grown HfO2 and ZrO2 High-k dielectrics, Microelectronic Reliability, 47, (536-539).
  1. S. Abermann, G. Sjoblom, J. Efavi, M. Lemme, J. Olsson, E. Bertagnolli, (2007), Comparative Study on the Impact of TiN and Mo Metal Gates on MOCVD-Grown HFO2  and ZrO2 High-k Dielectrics for CMOS Technology, American Institute of Physics, pp293-294.
  1. H.J. Osten, and H. Kurz, M. Schmidt, J. K. Efavi, M. C. Lemme, (2006), 0.86 nm CET Gate Stacks with epitaxial Gd2 O3 High-K dielectrics and FUSI NiSi Metal Electrodes, IEEE Electron Dev. Lett., 27(10), pp. 814-816.
  1. H.D.B. Gottlob, T. Echtermeyer, T. Mollenhauer, M. Schmidt, J.K. Efavi, T. Wahlbrink, M.C. Lemme, H. Kurz, R. Endres, Y. Stefanov, U. schwalke, M. Czernoborsky, e. Bugiel, A. fissel, H.J. Osten, (2006), Approaches to CMOS Integration of Epitaxial Gadolinium Oxide high-K Dielectrics, IEEE, Solid State Device Research, pp150-153.
  1. J.K. Efavi, M.C. Lemme, T. Mollenhauer, M. Schmidt, H.D.B. Gottlob, T. Wahlbrink,           H. Kurz, (2006), Nanoscale TiN Metal Gate Technology for CMOS Integration, Microelectronic Engineering Vol 83, Issues 4 - 9, pp. 1551 - 1554.
  1. A. Fuchs, M. Bender, J. K. Efavi, H. D. B. Gottlob, M. C. Lemme, H. Kurz, (Nov/Dec 2006), Nanowire Fin Field Effect Transistors via UV-based Nano-imprint Lithography, Journal of Vacuum Science Technology B 24(6), pp2964-2967.
  1. H.D.B. Gottlob, T. Echtermeyer, T. Mollenhauer, J. Efavi, M. Schmidt, T. Wahlbrink, M.C. Lemme, H. Kurz, M. Czernohorsky, E. Bugiel, H.-J. Osten, A. Fissel, (2006), CMOS Integration of Epitaxial Gd2O3 High-K Gate Dielectrics Solid State Electronics,   Vol.50, Issue 6, pp. 979 - 985.
  1. H.D.B. Gottlob, T. Echtermeyer, T. Mollenhauer, J. Efavi, M. Schmidt, T. Wahlbrink, M.C. Lemme, and H. Kurz, (2006), Investigation of High-K Gate Stacks with Epitaxial Gd2O3 and FUSI NiSi Metal Gates down to CET = 0.86nm, Materials Science in Semiconductor Processing, Volume 9, Issue 6,     pp. 904 - 908.
  1. Yu. Gomenyuk, A. Nazarov, J.K. Efavi, Ya. Vovk, Yi Lu, Octavian Buiu, Steve Hall, M.C.  Lemme, (2006), Low-Temperature Conductance Measurements of Surface States in HfO2-Si Structures with Different Gate Materials, Materials Science in Semiconductor Processing, vol. 9, pp 980-984
  1. H.D.B. Gottlob, T. Mollenhauer, T. Wahlbrink, M. Schmidt, T. Echtermeyer, J.K. Efavi, M.C. Lemme and H. Kurz, (Mar/Apr 2006), Scalable Gate First Process for SOI MOSFETs with Epitaxial High-k Dielectrics, Journal of Vacuum Science & Technology B, 24(2), pp. 710 - 714.
  1. J.K. Efavi, M.C. Lemme, T. Mollenhauer, T. Wahlbrink, H.D.B. Gottlob, H. Kurz, (2005), Tungsten Workfunktion Engineering for Dual Metal Gate Nano-CMOS, Journal of Materials Science: Materials in Electronics, Vol 16/7 pp 433 – 436.
  1. H.D.B. Gottlob, M.C. Lemme, T. Mollenhauer, T. Wahlbrink, J.K. Efavi, H. Kurz, Y.   Stefanov, K. Haberle, R. Komaragiri, T. Ruland, F. Zaunert, U. Schwalke, (2005), Introduction of Crystalline High-K Gate Dielectrics in a CMOS Process, Journal of Non-Crystalline Solids, Vol. 351, Issue 21-23, pp. 1885 - 1889.
  1. M. Schmidt, T. Mollenhauer, H.D.B. Gottlob, T. Wahlbrink, J.K. Efavi, L. Ottaviano, S. Cristoloveanu, M.C. Lemme and H. Kurz, (2005), Nickel-silicide Process for Ultra-Thin-Body SOI-MOSFETs, Microelectronic Engineering, Vol. 82 / 3-4, pp.   497 - 502.
  1. M.C. Lemme, J.K. Efavi, T. Mollenhauer, T. Wahlbrink, H.D.B. Gottlob, H. Kurz, (2005), Comparison of Metal Gate Electrodes on MOCVD HfO2 Microelectronics Reliability, Vol 45/5-6 pp 953 – 956.
  1. M. Lemme, T. Mollenhauer, W. Heinrich, H. Gottlob, J. Efavi, C. Welsh, M. Baus, O.         Winkler, B. Spangenberg, and H. Kurz, (2005), Highly Selective HBr Etch Process for the Fabrication of Triple Gate MOSFETs, Micoelectronic Engineering Vol. 78 - 79, pp. 212 - 217.
  1. M. Lemme, T. Mollenhauer, W. Heinrich, H. Gottlob, J. Efavi, M. Baus, O. Winkler, B.Spangenberg, and H. Kurz, (2004), Subthreshold Characteristics of p-type Triple Gate MOSFET Solid State Electronics, Vol. 48, Issue 4, pp. 529-534.
  1. J. Efavi, M. Lemme, T. Mollenhauer, H. Gottlob, and H. Kurz, Investigation of NiAIN as CMOS Gate material, (2004), Microelectronic Engineering, Vol. 76/1-4, pp. 353-358.

https://www.researchgate.net/profile/Johnson_Efavi